Working Principle
Electrons continuously collide with argon atoms in the motion process,ionizing a large number of argon ions to
bombard the target. After multiple collisions, the energy of electrons gradually decreases.Electrons break away
from the restriction of magnetic line of force, keep away from the target, and finally deposit on the substrate.

Features

Model	MSC-ADC-X—X
Coating type	Various dielectric films such as metal film, metal oxide and AIN
Coating temperature range	Normal temperature to 500℃
Coating vacuum chamber size	700mm750mm700mm (Customizable)
Background vacuum	< 5×10^-7mbar
Coating thickness	≥ 10nm
Thickness control precision	≤ ±3%
Maximum coating size	≥ 100mm (Customizable)
Film thickness uniformity	≤ ±0.5%
Substrate carrier	With planetary rotation mechanism
Target material	4×4 inches(compatible with 4 inches and below)
Power supply	The power supplies such as DC, pulse, RF, IF and bias are optional
Process gas	Ar, N₂, O₂
Note: Customized production available.

Coating Sample

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Roughly vacuumize;
→ Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;
→ Heating the vacuum chamber until the temperature reaches the target ;
→ Implement the constant temperature control;
→ Clean elements;
→ Revolve and back to the origin;
→ Coating film according to process requirements;
→ Lower temperature and stop the pump assembly after coating;
→ Stop working when the automatic operation is finished.

Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.

Our ISO Certification

Parts Of Our Patents

Parts Of Our Awards and Qualifications of R&D